A novel method for positioning of InAs islands on GaAs(110)

A novel method for positioning of InAs islands on GaAs (110) by cleaved edge overgrowth is reported. The first growth sample contains strained InxGa1-xAs/GaAs superlattice (SL) of varying indium fraction, which acts as a strain nanopattern for the cleaved-edge overgrowth. Atoms incident on the cleaved edge will preferentially migrate to InGaAs regions where favorable bonding sites are available. By this method InAs island chains with lateral periodicity defined by the thickness of InGaAs and GaAs of SL have been realized by molecular beam epitaxy (MBE). They are observed by means of atomic force microscopy (AFM). The strain nanopattern's effect is studied by the different indium fraction of SL and MBE growth conditions. (c) 2005 Elsevier B.V. All rights reserved.

ON THE SIGNIFICANCE OF WAVELENGTH POSITIONING ACCURACY IN MULTICOMPONENT ANALYSIS TECHNIQUES FOR THE CORRECTION OF LINE INTERFERENCES IN INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION-SPECTROMETRY

The present paper reports some definite evidence for the significance of wavelength positioning accuracy in multicomponent analysis techniques for the correction of line interferences in inductively coupled plasma atomic emission spectrometry (ICP-AES). Using scanning spectrometers commercially available today, a large relative error, DELTA(A) may occur in the estimated analyte concentration, owing to wavelength positioning errors, unless a procedure for data processing can eliminate the problem of optical instability. The emphasis is on the effect of the positioning error (deltalambda) in a model scan, which is evaluated theoretically and determined experimentally. A quantitative relation between DELTA(A) and deltalambda, the peak distance, and the effective widths of the analysis and interfering lines is established under the assumption of Gaussian line profiles. The agreement between calculated and experimental DELTA(A) is also illustrated. The DELTA(A) originating from deltalambda is independent of the net analyte/interferent signal ratio; this contrasts with the situation for the positioning error (dlambda) in a sample scan, where DELTA(A) decreases with an increase in the ratio. Compared with dlambda, the effect of deltalambda is generally less significant.

WAVELENGTH POSITIONING ERRORS AND TRUE DETECTION LIMIT IN RELATION TO MULTICOMPONENT ANALYSIS TECHNIQUES FOR THE CORRECTION OF LINE INTERFERENCES IN INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION-SPECTROMETRY

The present paper deals with the evaluation of the relative error (DELTA(A)) in estimated analyte concentrations originating from the wavelength positioning error in a sample scan when multicomponent analysis (MCA) techniques are used for correcting line interferences in inductively coupled plasma atomic emission spectrometry. In the theoretical part, a quantitative relation of DELTA(A) with the extent of line overlap, bandwidth and the magnitude of the positioning error is developed under the assumption of Gaussian line profiles. The measurements of eleven samples covering various typical line interferences showed that the calculated DELTA(A) generally agrees well with the experimental one. An expression of the true detection limit associated with MCA techniques was thus formulated. With MCA techniques, the determination of the analyte and interferent concentrations depend on each other while with conventional correction techniques, such as the three-point method, the estimate of interfering signals is independent of the analyte signals. Therefore. a given positioning error results in a larger DELTA(A) and hence a higher true detection limit in the case of MCA techniques than that in the case of conventional correction methods. although the latter could be a reasonable approximation of the former when the peak distance expressed in the effective width of the interfering line is larger than 0.4. In the light of the effect of wavelength positioning errors, MCA techniques have no advantages over conventional correction methods unless the former can bring an essential reduction ot the positioning error.

EVALUATION OF THE EFFECT OF WAVELENGTH POSITIONING ERRORS ON KALMAN FILTERING RESULTS IN INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION-SPECTROMETRY

This work evaluates the effect of wavelength positioning errors in spectral scans on analytical results when the Kalman filtering technique is used for the correction of line interferences in inductively coupled plasma atomic emission spectrometry (ICP-AES). The results show that a positioning accuracy of 0.1 pm is required in order to obtain accurate and precise estimates for analyte concentrations. The positioning error in sample scans is more crucial than that in model scans. The relative bias in measured analyte concentration originating from a positioning error in a sample scan increases linearly with an increase in the magnitude of the error and the peak distance of the overlapping lines, but is inversely proportional to the signal-to-background ratio. By the use of an optimization procedure for the positions of scans with the innovations number as the criterion, the wavelength positioning error can be reduced and, correspondingly, the accuracy and precision of analytical results improved.

狭缝投影位置传感技术及其在精密定位中的应用

提出了一种基于狭缝投影的位置传感技术，阐述了此技术的传感原理及其在精密定位中的应用。准直激光束照明的投影狭缝由一个透镜以掠入射角度投影在被测物体上，狭缝投影经过被测物体表面的反射和另一个透镜的成像在探测双缝上形成投影狭缝像。探测双缝放大成像在双像限探测器上，投影狭缝像透过探测双缝的光强分别被双像限探测器的两个像限所接收，通过检测双像限探测器两个像限上的光强获得被测物体的位置。实验验证了此传感技术的可行性，其位置重复测量偏差小于32nm（1σ）。

Splitting of femtosecond laser pulses by using a Dammann grating and compensation gratings

When a Dammann grating is used to split a beam of femtosecond laser pulses into multiple equal-intensity beams, chromatic dispersion will occur in beams of each order of diffraction and with different scale of angular dispersion because the incident ultrashort pulse contains a broad range of spectral bandwidths. We propose a novel method in which the angular dispersion can be compensated by positioning an m-time-density grating to collimate the mth-order beam that has been split, producing an array of beams that are free of angular dispersion. The increased width of the compensated output pulses and the spectral walk-off effect are discussed. We have verified this approach theoretically and validated it through experiments. It should be highly interesting in practical applications of splitting femtosecond laser pulses for pulse-width measurement, pump-probe measurement, and micromachining at multiple points. (c) 2005 Optical Society of America.

一种测量光刻机工件台方镜不平度的新方法

提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。以方镜平移补偿量与旋转补偿量为测量目标,使用两个双频激光干涉仪分别测量工件台在x和y方向的位置和旋转量；将方镜不平度的测量按照一定的偏移量分成若干个序列,每一个序列包括对方镜有效区域的若干次往返测量；根据所有序列的测量结果计算出方镜的旋转补偿量；为每一个序列建立临时边界条件,并据此计算出每一序列所测得的方镜粗略平移补偿量；采用三次样条插值与最小二乘法建立每一个序列间的关系,以平滑连接所有测量序列得到精确的方镜平移补偿量。结果表明,该方法用于测量方镜平

In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer

Topography of a granite surface has an effect on the vertical positioning of a wafer stage in a lithographic tool, when the wafer stage moves on the granite. The inaccurate measurement of the topography results in a bad leveling and focusing performance. In this paper, an in situ method to measure the topography of a granite surface with high accuracy is present. In this method, a high-order polynomial is set up to express the topography of the granite surface. Two double-frequency laser interferometers are used to measure the tilts of the wafer stage in the X- and Y-directions. From the sampling tilts information, the coefficients of the high-order polynomial can be obtained by a special algorithm. Experiment results shows that the measurement reproducibility of the method is better than 10 nm. (c) 2006 Elsevier GmbH. All rights reserved.

大行程高分辨率微定位机构的设计分析

压电驱动器的位移输出能力有限，因此通常借助于柔性机构对其位移量进行放大。对常用的柔性放大机构的性能进行了分析。提出一种柔性八杆放大机构，并对其进行有限元分析和理论计算。为了提高放大率，提出两级串连式机构。机构整体具有结构紧凑、放大效率较高的优点。

五自由度纳米级定位精度机构的研制

提出一种新型的五自由度精密定位平台的工作原理及其设计方法。工作台采用压电陶瓷作为驱动元件，柔性导向机构实现平移及转动功能。整个工作台可由整块金属材料通过线切割加工制成，实现一体化加工，而且结构紧凑。并给出导向机构刚度计算公式及设计实例。

大行程高分辨率微定位机构的设计分析

压电驱动器的位移输出能力有限，通常借助于柔性机构对其位移量进行放大。提出一种柔性八杆放大机构，并对其进行有限元分析和理论计算。为了提高放大率，提出两级串连式机构。机构整体具有结构紧凑、放大效率较高的优点。

五自由度纳米级定位工作台的设计研究

提出一种新型的五自由度精密定位平台的工作原理及其设计方法。工作台采用柔性导向机构实现平移及转动功能，采用压电陶瓷作为驱动元件，外置纳米级电容传感器作为位移量测量反馈元件，采用数字PID控制方法，可以实现纳米级精度的定位。给出了多种形式柔性导向机构刚度计算公式及设计实例。

Design and control of an ultraprecision stage used in grating tiling

In petawatt laser system, the gratings used to compose pulse compressor are very large in size which can be only acquired currently by arraying small aperture gratings to form a large one instead, an approach referred to as grating tiling. Theory and experiments have demonstrated that the coherent addition of multiple small gratings to form a larger grating is viable, the key technology of which is to control the relative position and orientation of each grating with high precision. According to the main factors that affect the performance of the grating tiling, a 5-DOF ultraprecision stage is developed for the grating tiling experiment. The mechanism is formed by serial structures. The motion of the mechanism is guided by flexure hinges and driven by piezoelectric actuators and the movement resolution of which can achieve nanometer level. To keep the stability of the mechanism, capacitive position sensors with nanometer accuracy are fixed on it to provide feedback signals with which to realize closed-loop control, thus the positioning precision of the mechanism is within several nanometers range through voltage control and digital PID algorithm. Results of experiments indicate that the performance of the mechanism can meet the requirement of precision for grating tiling.}

Study on eight-pass dual-frequency laser interferometer with nanometer precision

A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interferometers. A static positioning error measuring method has been used to examine the precision and repeatability of the laser interferometer. An optical resolution of 1.24 nm and an accuracy of nanometer scale have been achieved.

Effect of Copassivation of Cl and Cu on CdTe Grain Boundaries

Using a first-principles method, we investigate the structural and electronic properties of grain boundaries (GBs) in polycrystalline CdTe and the effects of copassivation of elements with far distinct electronegativities. Of the two types of GBs studied in this Letter, we find that the Cd core is less harmful to the carrier transport, but is difficult to passivate with impurities such as Cl and Cu, whereas the Te core creates a high defect density below the conduction band minimum, but all these levels can be removed by copassivation of Cl and Cu. Our analysis indicates that for most polycrystalline systems copassivation or multipassivation is required to passivate the GBs.